PURPOSE: To permit formation of a spacer having a specified height on a substrate by partially removing the oriented film on the substrate by etching in using a mask material coated with a fibrous film and forming an insulating layer for the spacer by vapor deposition, etc., on the removed part.
CONSTITUTION: The fibrous film 23 of the mask material is opposed onto the oriented film formed on the substrate by using the mask material 21 formed with holes 22 of a prescribed pattern and applied with the fibrous film on the inside surface. The etching stage for partially removing the oriented film of the substrate based on the pattern of the mask material in this state and the stage for forming the insulating layer by vapor deposition or sputtering on the substrate surface removed of the oriented film are successively executed to form the spacer by the insulating layer. A polyimide or cellulose is usable as the material of the fibrous film 23 coated on the mask material 21 and nitride is usable as the material of the spacer 41. A sputtering method is applied as the forming method. The spacer having the specified height is thereby easily formed to the position different from the position of picture elements without damaging the liquid crystal orientation film on the substrate.
TANUMA SEIJI
OKABE MASAHIRO
| JPS5781234A | 1982-05-21 | |||
| JPS5660481A | 1981-05-25 | |||
| JPS56122012A | 1981-09-25 |