Title:
FORMATION OF WATER-REPELLENT THIN FILM
Document Type and Number:
Japanese Patent JP2592018
Kind Code:
B2
Abstract:
PURPOSE: To form a highly water-repellent thin film on various substrates with the angle of contact to water controlled to ≥110°C.
CONSTITUTION: Water, solvent, hydrolysis catalyst, silicon alkoxide and fluorine- contg. alkoxide are used as starting chemicals, and the water-repellent thin film is formed on a glass substrate by the sol-gel method. That is, 2-Butanol, ethylene glycol, water and hydrochloric acid are charged, agitated at room temp. and homogenized. The soln. is agitated, orthoethylsilicate is added little by little, and the soln. is agitated at room temp. for one hour. The soln. is allowed to stand for one day to obtain a coating soln. Various substrates are dipped, then pulled up, heated at 100°C for one hour, kept at 160°C for ten minutes, heated at 200°C for one hour and heat-treated at the firing temp. of 400°C for 10-60 minutes to form a thin film.
Inventors:
TSUCHA TOSHIO
Application Number:
JP17578291A
Publication Date:
March 19, 1997
Filing Date:
June 21, 1991
Export Citation:
Assignee:
MURAKAMI KAIMEIDO KK
TSUCHA TOSHIO
TSUCHA TOSHIO
International Classes:
B05D1/18; C03C17/25; C03C17/30; C08J7/04; C09D183/04; C09K3/18; (IPC1-7): C03C17/30; C08J7/04; C09K3/18
Domestic Patent References:
| JP4359086A | ||||
| JP4226639B1 |
Attorney, Agent or Firm:
Masayuki Asakura