PURPOSE: To form a superior pattern free from swelling phenomena or the like, by irradiating by electron beam or X-ray a positive type resist having a 3-dimensional reticular structure using methacrylic ester as a basic structure, and by developing a latent resist pattern with an organic solvent.
CONSTITUTION: (a) Units derived from methacrylic ester of the formula shown (R is 1W6C alkyl, haloalkyl, benzyl, or cyclohexyl); (b) units derived from monoolefinic unsaturated carboxylic acid having 1W3 C3WC12 groups; and (c) units derived from methacryloyl chloride are polymerized to form a 3-dimensional structure. The positive type resist having this structure are inrradiated by electron beam, X-ray, ultraviolet ray, or the like to draw a pattern, and this is developed with mixed solvents of acetone and an aliphatic saturated lower alcohol.
YONEDA YASUHIRO
KITAKOUJI TOSHISUKE
