PURPOSE: To form a thin soft magnetic film by a simple process, which has large saturation magnetic flux density, small coercive force, and excellent frequency characteristics, by setting film forming speed, partial pressure ratio of nitrogen, and substrate temperature to be the respective specified values, and performing sputtering deposition.
CONSTITUTION: A thin soft magnetic film is formed by sputtering and depositing Fe on a substrate in a mixed atmosphere of nitrogen and Ar. Sputtering deposition is performed under the following conditions; 25≤R/PN≤170, R≥1, and 350≤Ts≤600 where R(nm/s), PN(Pa), and Ts(K) are film forming speed, nitrogen partial pressure, and substrate temperature, respectively. In this case, a glass substrate, various kinds of metal substrate, a heat resistant plastic substrate like polyimide, etc., can be used. As to the sputtering method, a magnetron sputtering method capable of low pressure operation and high speed film formation is preferable. Thereby a thin soft magnetic film can be formed by a simple process which has large saturation magnetic flux density, small coercive force, and excellent frequency characteristics, and is suitable for head material of high density magnetic recording.
EBISAWA TAKASHI
YONEMOTO TAKAHARU
TAKAHASHI JUNZO
MURATA HIDEAKI
MIYAGAWA TSUGIO
