Title:
FOUNDATION GARMENT
Document Type and Number:
Japanese Patent JP3850770
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a foundation garment improved in productivity and avoiding waste of original fabric for bias tapes conventionary used while maintaining touch feeling at the sewn part of the reverse surface of the foundation garment to be favorable to the same extent as that in using the conventional bias tapes.
SOLUTION: The foundation garment 10 is formed by the following processes: setting at least two kinds of fabrics 11a, 11b, 12, 13, 14 and 15 including elastic fabrics and ordinary fabrics into a combination, and sewing up the fabrics to join them together. Backing tapes 16, 17 covering the sewn-up part along at least one of the sewn-up parts exposed at the reverse side are sewn up to the foundation garment. The backing tapes 16, 17 comprise flat braids each braided into such a width as to cover the sewn-up part.
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Inventors:
Takahiro Inoue
Toshio Fujisawa
Toshio Fujisawa
Application Number:
JP2002226777A
Publication Date:
November 29, 2006
Filing Date:
August 05, 2002
Export Citation:
Assignee:
Inoue Ribbon Industry Co., Ltd.
Toshio Fujisawa
Toshio Fujisawa
International Classes:
A41C1/12; A41D27/24; A41C1/06; A41C3/00; A41C3/12; D04C1/06; (IPC1-7): A41C1/12; A41C1/06; A41C3/00; A41C3/12; D04C1/06; //A41D27/24
Domestic Patent References:
| JP2002161404A | ||||
| JP8325810A | ||||
| JP11302943A | ||||
| JP57106786A |
Attorney, Agent or Firm:
Ryoji Yoshida
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