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Title:
FRIT FOR ACID-RESISTANT ENAMEL AND GLAZE USING THE SAME
Document Type and Number:
Japanese Patent JPH0859290
Kind Code:
A
Abstract:

PURPOSE: To obtain a frit for acid-resistant enamels, capable of imparting acid resistance to enamels without increasing the content of SiO2 or Al2O3 by adding Ag2O to an enamel frit comprising SiO2, B2O3 and one or more alkali metal oxide components selected from Na2O, K2O and Li2O.

CONSTITUTION: The content of Ag2O is preferably 0.05-2.0wt.%. The obtained frit for acid-resistant enamels has a thermal expansion coefficient of 80-150×10-7/K and a softening point of 420-580°C. For the production of the frit for the enamels, these components are mixed with each other, and silica, feldspar, etc., are used as the raw materials of the SiO2. The mixture is melted at 1000-1500°C. A tank oven, a crucible oven, etc., is used as a melting oven. Finally, the melted mixture is quenched in water or in air to obtain the frit for the enamels. For example, a mixture comprising 100wt.% of a frit for enamels, 5wt.% of a clay, 0.5wt.% of potassium chloride, 45wt.% of water, etc., is used as a glaze used for the formation of the enamel layer.


Inventors:
SUGIE ETSUJI
Application Number:
JP19702194A
Publication Date:
March 05, 1996
Filing Date:
August 22, 1994
Export Citation:
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Assignee:
NGK INSULATORS LTD
NGK FRIT KK
International Classes:
C03C8/02; C23D5/00; (IPC1-7): C03C8/02; C23D5/00
Attorney, Agent or Firm:
Ippei Watanabe