Title:
GAS BARRIER FILM, MANUFACTURING METHOD OF GAS BARRIER FILM, AND MANUFACTURING APPARATUS OF GAS BARRIER FILM
Document Type and Number:
Japanese Patent JP2014240051
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To improve gas barrier property and wet heat resistance while shortening manufacturing time of a gas barrier film.SOLUTION: In a manufacturing method of a gas barrier film of the present invention, a droplet coating process of coating solution containing polysilazane in droplets onto one surface of a resin film base material; a drying process of drying the solution coated onto the one surface by the droplet coating process to form a polysilazane layer; and a modification process of modifying the polysilazane layer into a gas barrier layer by performing ultraviolet irradiation or plasma irradiation to the polysilazane layer under the atmosphere of low oxygen concentration are performed in this order. On the droplet coating process, light energy is imparted to the solution which is transformed into droplets.
Inventors:
HIROSE TATSUYA
KURAKATA SHINICHI
KURAKATA SHINICHI
Application Number:
JP2013123336A
Publication Date:
December 25, 2014
Filing Date:
June 12, 2013
Export Citation:
Assignee:
KONICA MINOLTA INC
International Classes:
B05D7/24; B05B5/025; B05C9/08; B05C9/12; B05D1/02; B05D1/04; B05D3/04; B05D3/06; B05D7/04; B32B9/00
Attorney, Agent or Firm:
Patent business corporation Mitsuaki international patent firm
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