Title:
GAS BARRIER FILM AND MANUFACTURING METHOD THEREFOR
Document Type and Number:
Japanese Patent JP2019116079
Kind Code:
A
Abstract:
To provide a gas barrier film maintaining gas barrier property by stably maintaining adhesiveness of a substrate and an atom layer deposition film while increasing productivity, and a manufacturing method therefor.SOLUTION: A gas barrier film 10 has a substrate 11 consisting of a polymer material, and an atom layer deposition film 12 formed on a surface 11a of the substrate 11 and containing oxide of aluminum and oxide of elements other than aluminum, and satisfying a relationship of maximum value of Z1
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Inventors:
SUZUKI SEIYA
Application Number:
JP2017252572A
Publication Date:
July 18, 2019
Filing Date:
December 27, 2017
Export Citation:
Assignee:
TOPPAN PRINTING CO LTD
International Classes:
B32B9/00; C23C16/40
Attorney, Agent or Firm:
Yasushi Matsunuma
Shiro Suzuki
Yuichiro Shimizu
Makiko Otsuki
Shiro Suzuki
Yuichiro Shimizu
Makiko Otsuki