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Title:
Gas control device
Document Type and Number:
Japanese Patent JP6156507
Kind Code:
B2
Abstract:
A gas control device (100) includes a first pump (101), a second pump (201), a first check valve (102), a second check valve (202), and a receptacle (9). The volume of the receptacle (9) changes in accordance with the pressure of air flowing thereinto. The first pump (101) has an air suction hole (53) and an air discharge hole (24). The second pump (201) has an air suction hole (197) and an air discharge hole (181). The first pump (101) is a type of pump having a high discharge flow rate and a low discharge pressure. The second pump (201) is a type of pump having a low discharge flow rate and a high discharge pressure. The suction hole (53) of the first pump (101) communicates with a first ventilation hole (106). The suction hole (197) of the second pump (201) communicates with a second ventilation hole (107).

Inventors:
Atsuhiko Hirata
Application Number:
JP2015539036A
Publication Date:
July 05, 2017
Filing Date:
August 29, 2014
Export Citation:
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Assignee:
MURATA MANUFACTURING CO.,LTD.
International Classes:
F04B49/06; F04B41/06; F04B45/047
Domestic Patent References:
JP1100392A
JP7042440U
JP4563767B2
JP2013068215A
JP9184482A
Foreign References:
WO2009148008A1
Attorney, Agent or Firm:
Kaede International Patent Office