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Title:
半導体製造装置のガス分流供給装置
Document Type and Number:
Japanese Patent JP5754853
Kind Code:
B2
Abstract:
A gas branched flow supplying apparatus for semiconductor manufacturing equipment. An arithmetic and control unit 7 works to successively open the respective branched pipe passage opening/closing valves 10a, 10n for a predetermined time and then close the valves, and the gas branched flow supplying apparatus performs flow control of the process gas distributed through the orifice 6 by the pressure type flow control unit 1a, and branches and supplies the process gas by opening and closing the branched pipe passage opening/closing valves 10a, 10n.

Inventors:
Nishino Isao
Ryosuke Toi
Shinichi Ikeda
Kaoru Hirata
Kazuyuki Morisaki
Application Number:
JP2012016266A
Publication Date:
July 29, 2015
Filing Date:
January 30, 2012
Export Citation:
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Assignee:
Fujikin Co., Ltd.
International Classes:
G05D7/06; G05D11/13
Domestic Patent References:
JP2004280788A
JP2005115501A
JP7028529A
JP4197648B2
Attorney, Agent or Firm:
Takeshi Sugimoto
Yata Ryuichi



 
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