Title:
GAS FLOW RATE CONTROLLER AND GAS FLOW RATE CONTROLLING METHOD USING SAME
Document Type and Number:
Japanese Patent JP3191526
Kind Code:
B2
Abstract:
PURPOSE: To enable controlling gas flow rate while maintaining the constant flow rate ratio of two or more kinds of gas.
CONSTITUTION: When SiH4 gas and N2 gas are introduced, while maintaining a constant flow rate ratio, into a treatment equipment with a first MFC(mass flow controller) 31 and a second MFC 32, the flow rate is controlled in the first MFC 31 by comparing a flow rate detection signal A1 obtained by detecting the flow rate of the SiH4 gas with a flow rate setting signal B outputted from a potentiometer 10 for flow rate setting. In the second MFC 32, the flow rate of the N2 gas is controlled by comparing a detection operation signal A'2 calculated on the basis of the flow rate detection signal A1 and a specified flow rate ratio with a flow rate setting signal B2 outputted from a potentiometer 18 for flow rate setting.
Inventors:
Yoshio Oka
Application Number:
JP24574793A
Publication Date:
July 23, 2001
Filing Date:
September 30, 1993
Export Citation:
Assignee:
ソニー株式会社
International Classes:
C30B25/14; B01J4/02; G05D11/02; H01L21/205; (IPC1-7): H01L21/205; B01J4/02; C30B25/14; G05D11/02
Domestic Patent References:
| JP4161241A | ||||
| JP4109616A | ||||
| JP58115812A | ||||
| JP588755A | ||||
| JP222472A |
Attorney, Agent or Firm:
Akira Koike (2 outside)