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Title:
GAS LEVITATION STAGE DEVICE AND SUBSTRATE INSPECTING DEVICE
Document Type and Number:
Japanese Patent JP2013071807
Kind Code:
A
Abstract:

To provide a gas jetting nozzle capable of easily controlling a flow rate at a low cost.

A gas levitation stage levitates and moves a substrate by blowing gas jets from a number of gas feeding nozzles onto a lower surface of the substrate. The gas feeding nozzle is provided with a spiral part formed in a female screw formation process in a gas flow channel. Since the gas jetting nozzle having a spiral part is formed in the female screw formation process, it can be easily formed on the entire surface of the stage at a low cost, and its flow rate can be controlled by the spiral part.


Inventors:
KINUGAWA KOHEI
SHIMODA YUICHI
Application Number:
JP2011211916A
Publication Date:
April 22, 2013
Filing Date:
September 28, 2011
Export Citation:
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Assignee:
HITACHI HIGH TECH CORP
International Classes:
B65G51/03
Attorney, Agent or Firm:
Kozo Takahashi



 
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