To give a gas line system which realizes a low cost and a small foot print.
The gas line system for use in a semiconductor manufacturing apparatus having at least two reactors is composed of a flow divider means composed of at least one gas source, a primary inlet port for receiving a source gas from the gas source and a secondary outlet port for equally dividing and outputting the inputted gas source. The primary inlet port is connected to the gas source and the secondary outlet port is composed of a flow divider means connected to the reactors and one exhaust pump connected to the reactors for exhausting the gas from the reactors. The system preferably comprises APCs provided between the reactors and the exhaust pump for controlling the pressure every reactor.
WO/2000/039652 | PERFORMANCE-BASED CONTROL SYSTEM |
JP3493028 | [Title of Invention] Method for preparing mixed products |
SUWADA MASAE
JPH01184818A | 1989-07-24 | |||
JPH10158843A | 1998-06-16 | |||
JPH0345957U | 1991-04-26 | |||
JPS62105997A | 1987-05-16 | |||
JPH04100222A | 1992-04-02 |
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