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Patent Searching and Data


Title:
GAS SCRUBBER AND GAS TREATMENT BY UTILIZING THE SAME
Document Type and Number:
Japanese Patent JPH10263357
Kind Code:
A
Abstract:

To make it possible to effectively remove the gases into which the harmful components generated during the production process of semiconductor devices are included by utilizing a burning device and an adsorption device and subjecting the inflammable harmful components to a primary treatment with the burning device, then subjecting these components to the adsorption treatment of the residual harmful components.

This gas scrubber has the burning device 1 which is supplied with the gases generated in the production process for the semiconductor devices through on induction pipe 13 into a box-shaped cabinet 3 having a door on its one lateral side and which functions to burn these gases and the adsorption device 2 which adsorbs the compsn. of the gases unburned by the burning device 1 and physically and chemically treats the adsorption components. The burning device 1 is constituted to burn the gases by the ceramic heaters built therein and to recover the sludge generated at this time into a storage vessel 7. The combustion gases are cooled by a cooler 44 which is disposed around the burning device 1 and uses cooling water during the time the gases are supplied from the burning device 1 to the adsorption device 2.


Inventors:
KIM DONG SOO
Application Number:
JP33982197A
Publication Date:
October 06, 1998
Filing Date:
December 10, 1997
Export Citation:
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Assignee:
KOREA MAT CO LTD
International Classes:
B01D53/34; B01D53/04; B01D53/46; B01D53/81; B01D53/82; B01D53/86; B01D53/88; F23G7/06; F23J3/02; F23J15/02; F23J15/06; H01L21/205; H01L21/31; (IPC1-7): B01D53/34; B01D53/46; B01D53/81; B01D53/86; H01L21/205
Attorney, Agent or Firm:
Tadao Hirata