Title:
GAS THERMAL DECOMPOSITION APPARATUS
Document Type and Number:
Japanese Patent JP3464474
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a gas thermal decomposition apparatus capable of surely making a harmful gas non-pollutive without causing gas choking.
SOLUTION: The gas thermal decomposition apparatus for making the harmful gas containing fluorine non-pollutive by a thermal decomposing reaction has an introducing pipe 1 for introducing the harmful gas, a reaction tube 2 which is connected to the introducing pipe 1 and in which a packing material S1 containing silicon producing a reaction gas by the reaction with the harmful gas is packed, a discharge pipe 3 connected to the reaction tube 2 and for discharging the reaction gas and a heater 4 for heating the reaction tube 2. The reaction tube 2 is positioned below the introducing pipe 1 and the discharge pipe 2. The powdery packing material S2 made small-sized by the reaction with the harmful gags falls down to the lower part of the reaction tube 2 and further reacts with the harmful gas.
More Like This:
Inventors:
Yuusuke Harada
Application Number:
JP2002237441A
Publication Date:
November 10, 2003
Filing Date:
April 30, 1992
Export Citation:
Assignee:
Oki Electric Industry Co., Ltd.
International Classes:
B01D53/68; B01D53/34; B01J8/06; (IPC1-7): B01J8/06; B01D53/34; B01D53/68
Domestic Patent References:
| JP2273511A | ||||
| JP360401A | ||||
| JP50129604A | ||||
| JP3228801A | ||||
| JP6348570B2 |
Attorney, Agent or Firm:
Kuninori Funabashi