GAS TREATMENT APPARATUS

Japanese Patent JP2010234255

A

To obtain high gas treatment capacity without using the high voltage power supply of a large capacity.

A high voltage application means 20 is set. The first electrode 8 of a honeycomb structure 4 is connected to the positive voltage supply terminal T1 of the high voltage application means 20, and the second electrode 9 of the honeycomb structure 4 is connected to the negative voltage supply terminal T2 of the high voltage application means 20. Driving pulses PS1 and PS2 are output to integrated circuits IC1 and IC2 for switching by a control part CNT, and a positive voltage +V1 rising in a positive direction from a ground potential to the first electrode 8 and a negative voltage -V2 falling in a negative direction from the ground potential to the second electrode 9 are alternately switched and applied. At the time, by delaying the ON timing of the driving pulse PS2 for TC time relative to the ON timing of the driving pulse PS1, a differential voltage V1+V2 (high voltage) between the positive voltage +V1 and the negative voltage -V2 is applied between the first electrode 8 and the second electrode 9 during the delay time TC.

OYA YASUHIRO
IWATA MASAYUKI
IGUCHI TOSHIMARU

JP2009084763A

October 21, 2010

March 31, 2009

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YAMATAKE CORP

B01D53/56; B01D53/72; B01D53/74; B01J19/08

JP3040358B2	2000-05-15
JP2009165939A	2009-07-30
JP2008194670A	2008-08-28
JP2001035694A	2001-02-09
JPH0448727A	1992-02-18
JP2001334147A	2001-12-04
JP2004055362A	2004-02-19
JPH03193150A	1991-08-22
JPH05220340A	1993-08-31
JP2010234256A	2010-10-21
JP2003100482A	2003-04-04

WO2008087944A1

2008-07-24

Masaki Yamakawa
Shigeki Yamakawa

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