Title:
GASPHASE GROWTH
Document Type and Number:
Japanese Patent JPS52133086
Kind Code:
A
Abstract:
PURPOSE: To make membrane thickness even and impurity concentration distribution uniform by arranging samples horizontally in a reaction vessel installed with a reaction gas supply nozzle and an exhaust nozzle opposite to the supply nozzle, both nozzles having bradth not smaller than the diameter of the susceptor, and by revolving the samples to carry out chemical gas phase growth.
Inventors:
SHINTANI AKIRA
KOGIRIMA MASAHIKO
HONMA KOUJI
KAWAMURA MASAO
SAIDA KOUJI
TAMAOKI YOUICHI
MAKI MICHIYOSHI
KOGIRIMA MASAHIKO
HONMA KOUJI
KAWAMURA MASAO
SAIDA KOUJI
TAMAOKI YOUICHI
MAKI MICHIYOSHI
Application Number:
JP4857476A
Publication Date:
November 08, 1977
Filing Date:
April 30, 1976
Export Citation:
Assignee:
HITACHI LTD
International Classes:
C30B25/14; H01L21/205; H01L21/365; (IPC1-7): B01J17/32; H01L21/205; H01L21/365
Previous Patent: JPS52133085
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