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Title:
GATE VALVE
Document Type and Number:
Japanese Patent JP3433207
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide, for example, a gate valve which does not generate particles in a treatment chamber of a vacuum treatment apparatus used for manufacture of semiconductor device, control oscillations to the treatment chamber, and serves to space saving.
SOLUTION: This gate valve comprises a valve element 2 which can open/ close and seal an opening part, a valve rod 4 which holds the valve element 2, a seal bellows 6 for sealing between the valve rod 4 and an airtight chamber, a guide rail 61 which movably support the other end part 4b of the valve rod 4 in a horizontal direction and regulate directly moving of the valve rod 4 at a closed position and permit a tilt, a cam mechanism 31 which directly moves the valve rod 4 and convert a direct-acting force into a tilt force at the closed position to tilt the valve element 2, a cylinder device 50 which supplies the direct-acting force in the cam mechanism 31, and an elastic support means which regulates the tilt by gravity of the valve rod 4 moved to the closed position to actuate an elastic force resisting said tilt in response to the tilt of the valve rod 4 by the cam mechanism 31.


Inventors:
Yuzuru Tamura
Application Number:
JP35052799A
Publication Date:
August 04, 2003
Filing Date:
December 09, 1999
Export Citation:
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Assignee:
NOK Co., Ltd.
International Classes:
F16K3/18; F16K31/524; F16K51/02; (IPC1-7): F16K3/18; F16K51/02
Domestic Patent References:
JP11218238A
JP9303578A
JP9303577A
JP842715A
JP2001165350A
JP2000356271A
Attorney, Agent or Firm:
Takahisa Sato