HALFTONE TYPE PHASE SHIFT MASK BLANK AND METHOD OF MANUFACTURING HALFTONE TYPE PHASE SHIFT MASK BLANK

Title:

HALFTONE TYPE PHASE SHIFT MASK BLANK AND METHOD OF MANUFACTURING HALFTONE TYPE PHASE SHIFT MASK BLANK

Document Type and Number:

Japanese Patent JP2003195479

Kind Code:

A

Abstract:

To improve the dimensional accuracy of a halftone material film pattern of a halftone type phase shift mask manufactured by using a blank having a laminated structure of the halftone material film and a light shielding film.

The halftone type phase shift mask blank 1 having the halftone material film 3 on a transparent substrate 1 and the light shielding film consisting of a metallic film 4 and antireflection film 5 formed on the halftone material film 3 is formed by depositing the light shielding film in such a manner that the film thickness thereof attains a range from 50 to 77 nanometers. As a result, the difference in the film stress before and after the removal of the light shielding film is reduced in manufacturing the halftone type phase shift mask.

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Inventors:

YAMADA TAKAYUKI
MITSUI MASARU
USHIDA MASAO

Application Number:

JP2001400378A

Publication Date:

July 09, 2003

Filing Date:

December 28, 2001

Export Citation:

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Assignee:

HOYA CORP

International Classes:

G03F1/32; G03F1/54; G03F1/68; H01L21/027; (IPC1-7): G03F1/08; H01L21/027

Attorney, Agent or Firm:

Setsuo Aniya (2 outside)

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