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Title:
HALOGEN-BASED GAS CHARGING CONTAINER, GAS CHARGED IN THE SAME, AND METHOD FOR PROCESSING CHARGING CONTAINER
Document Type and Number:
Japanese Patent JP2004270917
Kind Code:
A
Abstract:

To provide a metal container for charging halogen-based gas provided with inner surface treatment by use of abrasive material, in which deterioration of purity due to increase of impurities other than water content or inner surface adsorption gas by aging will not occur after charging gas, and halogen-based gas of high purity.

This metal container for charging halogen-based gas is composed in such a way that area of Si2s peak in X-ray photoelectron spectrum on the inner surface of the metal container, to which inner surface treatment is conducted by use of abrasive material, divided by area of Fe2P3/2 peak is 0.3 or less.


Inventors:
YOSHIKAWA AKIO
KANAYAMA SHIGEO
HARADA ISAO
Application Number:
JP2003286792A
Publication Date:
September 30, 2004
Filing Date:
August 05, 2003
Export Citation:
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Assignee:
MITSUI CHEMICALS INC
International Classes:
B24B31/00; F17C1/00; F17C1/10; (IPC1-7): F17C1/00; B24B31/00; F17C1/10
Domestic Patent References:
JPH09165204A1997-06-24
JP2000257795A2000-09-19
JPH07179622A1995-07-18
JP2001287165A2001-10-16
JPS63267157A1988-11-04
JPH09323253A1997-12-16
JPH09302489A1997-11-25
JPH0926093A1997-01-28
JPH05329766A1993-12-14
JPH06312378A1994-11-08
JPH07164328A1995-06-27



 
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