Title:
HARD CARBON FILM, HARD CARBON FILM-COATED MEMBER AND FORMING METHOD OF HARD CARBON FILM
Document Type and Number:
Japanese Patent JP3291105
Kind Code:
B2
Abstract:
PURPOSE: To obtain a hard carbon film having smoothness, high wear resistance and high sliding property by forming the film in such a manner that the intensity ratios of peaks in the X-ray diffraction analysis of diamond satisfy specified relations.
CONSTITUTION: A silicon wafer is disposed as the base material 2 in a reactive furnace in an ECR plasma device. Microwaves are generated from a microwave generating device 3, while methane gas or the like is introduced through a gas inlet 5 to form a film on the base material 2. A hard carbon film containing diamond is produced. The X-ray diffraction analysis of the diamond in the film shows such relations of peak intensities as 1≤1b/1a≤10, 2≤1b/1c, 2≤1b/1d, wherein 1a, 1b, 1c, 1d are peak intensities for (111), (220), (311), (400), respectively. The film has 50-700W/(m-k) thermal conductivity and 3.20 to 3.45g/cm3 density.
Inventors:
Akitoshi Toyama
Application Number:
JP934494A
Publication Date:
June 10, 2002
Filing Date:
January 31, 1994
Export Citation:
Assignee:
Kyocera Corporation
International Classes:
B23B27/14; C23C16/26; C23C16/27; C23C16/50; C23C16/511; C30B29/04; (IPC1-7): C30B29/04
Domestic Patent References:
| JP63307196A | ||||
| JP63239195A | ||||
| JP63316427A | ||||
| JP2170978A |
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