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Patent Searching and Data


Title:
HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL
Document Type and Number:
Japanese Patent JP2000029162
Kind Code:
A
Abstract:

To provide a heat developable photosensitive material having excellent sensitivity, good coating property and no devitrification after thermal development.

This heat developable photosensitive material has a photosensitive layer 13 containing an org. silver salt, photosensitive silver halide particles and reducing agent on a supporting body 11. In this material, a layer containing inorg. fine particles or a fluorine-contg. polymer layer 12 is formed on the surface of the supporting body 11. Preferably, the layer containing the inorg. fine particles or the fluorine-contg. polymer layer 12 has voids and/or has ≤1.50 refractive index of the layer.


Inventors:
YAMATANI MITSUKO
Application Number:
JP19726498A
Publication Date:
January 28, 2000
Filing Date:
July 13, 1998
Export Citation:
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Assignee:
KONISHIROKU PHOTO IND
International Classes:
G03C1/498; G03C1/76; (IPC1-7): G03C1/498; G03C1/76