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Title:
HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL
Document Type and Number:
Japanese Patent JP2002372766
Kind Code:
A
Abstract:

To provide a heat developable photosensitive material which is free of creases and coating streaks in the formation of a photosensitive layer on a support and suppresses the occurrence of interference fringes after heat development.

In the heat developable photosensitive material having a photosensitive layer containing photosensitive silver halide and a non-photosensitive organic silver salt on a support of 100-300 μm thickness, the support contains polyethylene terephthalate, the difference between the maximum value and minimum value of thickness of the support in the overall width direction is 3-6 μm, and when the thickness of the support in the overall width direction is shown by a polygonal line graph, the maximum value of height forming a protrusion to a base line connecting points on the polygonal line graph corresponding to the thicknesses of both edges of the support is 3-6 μm.


Inventors:
TOHO KATSUNORI
Application Number:
JP2001179668A
Publication Date:
December 26, 2002
Filing Date:
June 14, 2001
Export Citation:
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Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03C1/76; (IPC1-7): G03C1/76
Attorney, Agent or Firm:
Atsushi Nakajima (3 outside)