Title:
プラズマが存在する真空環境の加熱
Document Type and Number:
Japanese Patent JP2005516752
Kind Code:
A
Abstract:
A method of heating in a vacuum atmosphere in the presence of a plasma, comprises the following steps: a) providing infrared radiation means ( 16 ) in a vacuum chamber ( 10 ); b) providing a first electrical conductor ( 18 ) to the infrared radiation means ( 16 ); c) providing a second electrical conductor ( 20 ) from the infrared radiation means ( 16 ); d) putting an electrical voltage over said infrared radiation means ( 16 ); e) preventing the first conductor ( 18 ) and the second conductor ( 20 ) from having an electrical voltage above +55 Volt. The advantage is that arcing is avoided.
Inventors:
De Boschel, Will Mart
Denul, Jurgen
Goban, Guy
Persone, Bart
Joker Kim
Denul, Jurgen
Goban, Guy
Persone, Bart
Joker Kim
Application Number:
JP2003565207A
Publication Date:
June 09, 2005
Filing Date:
January 29, 2003
Export Citation:
Assignee:
N V BEKAERT SOCIETE ANONYME
International Classes:
B01J3/00; B01J19/08; C23C14/34; C23C14/54; C23C16/46; C23C16/48; C23C16/50; H01J37/02; H01L21/00; H05B3/00; H05B7/00; (IPC1-7): B01J19/08; B01J3/00
Attorney, Agent or Firm:
Shoichi Okuyama
Arihara Koichi
Matsushima Tetsuo
Arihara Koichi
Matsushima Tetsuo