Title:
加熱ランプシステム及びその方法
Document Type and Number:
Japanese Patent JP2012521095
Kind Code:
A
Abstract:
Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a wafer carrier track for levitating and traversing a wafer carrier within a vapor deposition reactor system is provided which includes upper and lower sections of a track assembly having a gas cavity formed therebetween. A guide path extends along an upper surface of the upper section and between two side surfaces which extend along and above the guide path and parallel to each other. A plurality of gas holes along the guide path extends from the upper surface of the upper section, through the upper section, and into the gas cavity. In some examples, the upper and lower sections of the track assembly may independently contain quartz, and in some examples, may be fused together.
Inventors:
Hey, Gengu
Higashi, Greg
Solubuji, Kurseed
Hammam, Roger
Hededus, Andreas
Higashi, Greg
Solubuji, Kurseed
Hammam, Roger
Hededus, Andreas
Application Number:
JP2012500905A
Publication Date:
September 10, 2012
Filing Date:
March 16, 2010
Export Citation:
Assignee:
ALTA DEVICES,INC.
International Classes:
H01L21/31; C23C16/46
Attorney, Agent or Firm:
Patent business corporation Kita Aoyama International