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Patent Searching and Data


Title:
HIGH ACCURACY GAS DILUTION SYSTEM
Document Type and Number:
Japanese Patent JPH07151652
Kind Code:
A
Abstract:

PURPOSE: To obtain a system for producing an uncontaminated sample gas diluted at high accuracy.

CONSTITUTION: A main line 10 is provided with a flow rate sensor 16 and an exhaust gas flow rate control valve 15, fixed to an exhaust gas line 14, is controlled such that the flow rate sensor 16 will detect a preset flow rate of primary diluted gas. The primary diluted gas thus controlled is then admixed with a secondary diluted gas fed from a secondary diluted gas line 18 to produce a sample gas which is fed to the analyzer side through a sample gas supply line 20.


Inventors:
KITAMURA KAZUMI
TSUBOTA OSAMU
Application Number:
JP29934493A
Publication Date:
June 16, 1995
Filing Date:
November 30, 1993
Export Citation:
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Assignee:
TOKYO GAS CHEM KK
PURE CREATE KK
International Classes:
G01N1/00; B01F15/04; G05D11/02; (IPC1-7): G01N1/00; B01F15/04; G05D11/02
Attorney, Agent or Firm:
Hiroshi Ohashi