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Patent Searching and Data


Title:
HIGH CONCENTRATION RESIDUAL CHLORINE MEASURING SYSTEM
Document Type and Number:
Japanese Patent JPH06194337
Kind Code:
A
Abstract:

PURPOSE: To enhance the capability for measurement of high concentration residual chlorine in a liquid.

CONSTITUTION: The high concentration residual chlorine measuring system comprises a pump 8 for feeding a sample water to be mixed with pure water, a circuit 8b for operating the mixing ratio between the flow rate of the sample water measured by a sample water flowmeter 8a and the flow rate of pure water measured by a pure water flowmeter 6a, a reagentless residual chlorine meter 9 for measuring the concentration of chlorine contained in the mixture of pure water and sample water, and a multiplier 10 for multiplying the concentration of chlorine measured through the chlorine meter 9 by a mixing ratio.


Inventors:
ABE SATOSHI
Application Number:
JP34500192A
Publication Date:
July 15, 1994
Filing Date:
December 25, 1992
Export Citation:
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Assignee:
TOSHIBA CORP
International Classes:
G01N27/416; G05D11/03; (IPC1-7): G01N27/416; G05D11/03
Attorney, Agent or Firm:
Norio Ogo