To obtain a high molecular compound having high etching resistance in the case of being used for a photoresist.
The high molecular compound contains at least one kind of a monomer unit selected from formulas (1a) and (1b). (In the formulas, R1 represents a hydrogen atom, a 1-5C hydrocarbon group, a hydroxyl group which can be protected by a protective group, a -COOR3 group or the like. The R3 represents a hydrogen atoms, a tertiary hydrocarbon group which can have a substituent group, a tetrahydro furanyl group or the like. Y represents a univalent alicyclic group which can have a substituent group. (n) represents 0, 1 or 2. R2 represents a hydrogen atom, a 1-20C hydrocarbon group, a hydroxyl group which can be protected by a protective group, or the like, L represent a lactone ring of ≥5 members. Norbornane ring in the formula can have a substituent group in addition to the substituent group expressed by the formula.
INOUE KEIZO
FUNAKI KATSUNORI
NAKANO TATSUYA
HORAI AKIRA
