高圧処理装置および高圧処理方法 - Dainippon Screen Mfg. Co., Ltd.

Title:

高圧処理装置および高圧処理方法

Document Type and Number:

Japanese Patent JP4248989

Kind Code:

B2

Abstract:

Mixing baths 6 A and 6 B which temporarily hold chemical agents A and B respectively are disposed. The mixing baths 6 A and 6 B are each connected with a high-pressure fluid supplying unit 2 . For surface treatment using a mixture of the chemical agent A and SCF (processing fluid), SCF is fed under pressure from the high-pressure fluid supplying unit 2 to the mixing bath 6 A which already holds the chemical agent A, whereby the chemical agent A dissolves in SCF flowing into the mixing bath 6 A and the mixture of the chemical agent A and SCF (processing fluid) is created. As a high-pressure valve (processing fluid introducing valve) 39 is opened, the processing fluid is sent into a pressure vessel 1 . This achieves a predetermined surface treatment of a substrate which has been set inside the pressure vessel 1 , using the processing fluid.

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Inventors:

Yusuke Muraoka
Tomomi Iwata
Saito Kimitsugu
Masahiro Yamagata
Yoichi Inoue
Hisashi Oshiba

Application Number:

JP2003352168A

Publication Date:

April 02, 2009

Filing Date:

October 10, 2003

Export Citation:

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Assignee:

Dainippon Screen Mfg. Co., Ltd.
KABUSHIKI KAISHA KOBE SEIKO SHO

International Classes:

B08B3/08; B08B7/00; H01L21/304; G05D11/13; H01L21/306

Domestic Patent References:

JP2002353185A
JP2003031533A
JP4346035A
JP2001077074A
JP2000058492A
JP10326771A
JP10303164A

Foreign References:

WO2003041131A1

Attorney, Agent or Firm:

Ryose Uji
Kakusho Shoichi

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