Title:
高純度アンモニアガスの供給機器および供給方法
Document Type and Number:
Japanese Patent JP4823488
Kind Code:
B2
Abstract:
It is an object of the present invention to provide a system for feeding a high-purity ammonia gas, where a feeding apparatus free from generation of a particle due to corrosion and not causing the formation of a corrosion or reaction product inside the gas feeding path, such as cylinder valve, pressure regulator, pressure gauge, mass flow controller, line valve and filter, is appropriately employed for the gas flow path from a gas cylinder to a production apparatus, thereby realizing more safe and highly efficient feeding of the high-purity ammonia gas without deteriorating the purity and production of a semiconductor device having higher performance. The apparatus for feeding a high-purity ammonia gas of the present invention comprises the sealing part and/or the gas contacting part which comprise a halogen-free resin. The gas flow path of feeding a high-purity ammonia gas is constituted by the above-described high-purity ammonia gas-feeding apparatus, and thereby a high-purity ammonia gas can be fed to an apparatus for producing a semiconductor device without deteriorating the gas purity.
Inventors:
Hiroyasu Taguchi
Yasuhiro Kosuge
Yasuhiro Kosuge
Application Number:
JP2004124163A
Publication Date:
November 24, 2011
Filing Date:
April 20, 2004
Export Citation:
Assignee:
SHOWA DENKO K.K.
International Classes:
C01C1/02; C09K3/10; F16J15/12; F17C5/06; F17C7/00; F16J15/08
Domestic Patent References:
| JP2000046212A | ||||
| JP11302013A | ||||
| JP2002022207A | ||||
| JP2001107866A | ||||
| JP9210236A | ||||
| JP2002217118A | ||||
| JP48004362A |
Attorney, Agent or Firm:
Koji Makimura
Chihata Takahata
Toru Suzuki
Chihata Takahata
Toru Suzuki