高位置合わせ粒子転写システム

Japanese Patent JP7004604

B2

Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.

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Yunda One
Solob Reichauduri
Genpin Lou
Eugene M Chow
Julie A. Bert
David Biegersen
George A. Gibson
Jamie Calve

JP2018081019A

January 21, 2022

April 20, 2018

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Palo Alto Research Center Incorporated

H01L21/50

JP2010045145A
JP2007027551A
JP2007531321A

WO2014152592A1

Shinichiro Tanaka
Teshimaru Ken
Fumiaki Otsuka
Takayoshi Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Takeo Nasu
Takuji Toyoshima

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