PURPOSE: To make saturated magnetic flux density 2.2 T or more by alternately laminating by making the thickness of an fcc (facecentered cubic lattice) element film which has a phase isolation tendency from Fe 20 nm or less and the thickness of an Fe single layer film several or more times the thickness of the fcc element single layer film.
CONSTITUTION: The thickness of an fcc element single layer film is made 20 nm or less, the thickness of an Fe single layer film is made several or more times the fcc element single layer film and saturated magnetic flux density is made 2.2 T or more. The above-mentioned fcc element is Ag or Pd and the thickness of the Fe single layer film is made five or more times the thickness of an Ag or a Pd single layer film. If the Fe single layer film is made by sputtering or evaporation, prior growth orientation in general is (110). On the other hand, the prior growth orientation of Ag or Pd is (111). The growing of the crystal orientation of a multilayered film, however, keeping the relation of (110)/(111) is impossible due to greater lattice deformation. Accordingly, it is important that Ag (200) or Pd (200) which has the smallest spacing difference from Fe (110) is grown in parallel with the Fe (110) and the other face orientation is not grown.
WO/2004/000494 | COATED CUTTING TOOL MEMBER |
JPS6311661 | PRODUCTION OF MOLYBDENUM NITRIDE |
JP2005099757 | ANTI-REFLECTION COATING |
KOZONO YUZO
NARUSHIGE SHINJI
HANAZONO MASANOBU
SANO MASAAKI