Title:
中空シリカ粒子及びその製造方法
Document Type and Number:
Japanese Patent JP7132827
Kind Code:
B2
Abstract:
To provide a method for producing hollow silica particles which can reduce water absorbability of hollow silica particles compared to the conventional art.SOLUTION: A method for producing hollow silica particles comprises the following steps (1) and (2): (1) spray-drying a silica solution in which silica is dissolved in an organic alkali aqueous solution to obtain a hollow silica precursor, and (2) firing the hollow silica precursor under the following conditions 1 or 2 to obtain hollow silica particles. The condition 1: a temperature of 1100°C or more and less than 1150°C for 3 hours or longer. The condition 2: a temperature of 1150°C or more and 1400°C or less for 0.5 hours or longer.SELECTED DRAWING: Figure 3
Inventors:
Hiroki Hoshida
Application Number:
JP2018212224A
Publication Date:
September 07, 2022
Filing Date:
November 12, 2018
Export Citation:
Assignee:
Kao Corporation
International Classes:
C01B33/18
Domestic Patent References:
| JP2017193462A | ||||
| JP2003176121A | ||||
| JP2011207719A | ||||
| JP2009203115A |
Foreign References:
| WO2011093142A1 | ||||
| WO2015016359A1 |
Attorney, Agent or Firm:
Patent business corporation Ikeuchi and Partners