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Title:
HOLLOW SILICONE-BASED FINE PARTICLE-CONTAINING COSMETIC
Document Type and Number:
Japanese Patent JP2009057315
Kind Code:
A
Abstract:

To provide hollow silicon-based fine particles excellent in dispersibility with respect to compounding agents and a cosmetic excellent in transparency and the feeling of fitting to the skin.

The cosmetic comprises hollow silicone-based fine particles (A). The volume average particle diameter of the hollow silicone-based fine particles (A) is preferably 0.001-1 m and the content thereof is preferably 1-80 wt.%. It is preferred that the outer periphery of the hollow silicone-based fine particles (A) is composed of a silicone based compound (B) having at least one unit selected from the group consisting of an SiO4/2 unit, a RSiO3/2 unit, and a R2SiO2/2 unit at a ratio of the R2SiO2/2 unit of not more than 20 mol% and a ratio of the RSiO3/2 unit of not less than 50 mol%.


Inventors:
AMANO TAKAMITSU
TAKAGI AKIRA
Application Number:
JP2007225398A
Publication Date:
March 19, 2009
Filing Date:
August 31, 2007
Export Citation:
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Assignee:
KANEKA CORP
International Classes:
A61K8/891; A61Q19/00