Title:
リソグラフィ装置、デバイス製造方法、クリーニングシステム、およびパターニングデバイスをクリーニングする方法
Document Type and Number:
Japanese Patent JP5535194
Kind Code:
B2
Abstract:
A lithographic apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device is configured to impart a pattern to the beam of radiation. The apparatus includes a patterning device cleaning system configured to provide an electrostatic force to contaminant particles that are on the patterning device and that are electrically charged by the beam of radiation, in order to remove the contaminant particles from the patterning device.
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Inventors:
Scaca Barozzi, Luigi
Ivanov, Vladimir, Vitalevich
Koshereb, Konstantin, Nikolaevich
Morse, Johannes, Hubertus, Josefina
Stevens, Lucas, Henrykas, Johannes
Antsiferov, Pavel, Stanislavovich
Kribtun, Bradymia, Mikhailovich
Drohin, Leonid, Alexandrovich
Van Kampen, Marten
Ivanov, Vladimir, Vitalevich
Koshereb, Konstantin, Nikolaevich
Morse, Johannes, Hubertus, Josefina
Stevens, Lucas, Henrykas, Johannes
Antsiferov, Pavel, Stanislavovich
Kribtun, Bradymia, Mikhailovich
Drohin, Leonid, Alexandrovich
Van Kampen, Marten
Application Number:
JP2011505407A
Publication Date:
July 02, 2014
Filing Date:
April 16, 2009
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
H01L21/027; G03F1/24; G03F1/82
Domestic Patent References:
| JP9260245A | ||||
| JP11297595A | ||||
| JP2002124463A | ||||
| JP2003224067A | ||||
| JP2003234287A | ||||
| JP2003531402A | ||||
| JP2004207740A | ||||
| JP2007329288A |
Foreign References:
| WO2008044924A2 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Toshifumi Onuki