Title:
スクリーン印刷システム及びスクリーン印刷システムのマスクのクリーニング方法
Document Type and Number:
Japanese Patent JP5062243
Kind Code:
B2
Abstract:
It is an objective to provide a screen print system and a method for cleaning a mask of the screen print system that enable sufficient cleaning of the mask used for subjecting a cavity substrate to screen printing. A screen print system includes a first cleaning unit 16a and a second cleaning unit 16b. The first cleaning unit 16a sequentially brings a mask contact area R, which is formed by stretching a paper member 42 over an upper end of a nozzle part 41, into contact with lower surfaces of respective convex portions 13t of a first mask 13a, thereby removing paste Pst adhering to the respective lower surfaces of the respective convex portions 13t. The second cleaning unit 16b brings the mask contact area R, which is formed by stretching the paper member 42 over the upper end of the nozzle part 41, into contact with a lower surface of a second mask 13b, thereby removing the paste Pst adhering to the lower surface of the second mask 13b. The first cleaning unit 16a winds up the paper member 42 while removing the paste Pst adhering to the lower surfaces of the convex portions 13t of the first mask 13a.
Inventors:
Tetsuya Tanaka
Kunihiko Tokita
Kunihiko Tokita
Application Number:
JP2009284687A
Publication Date:
October 31, 2012
Filing Date:
December 16, 2009
Export Citation:
Assignee:
Panasonic Corporation
International Classes:
B41F35/00; B41F15/08; B41F15/12; B41F15/36; H05K3/34
Domestic Patent References:
| JP61164895A | ||||
| JP2212145A | ||||
| JP10296960A | ||||
| JP2000168040A | ||||
| JP2006269555A | ||||
| JP2071667U |
Attorney, Agent or Firm:
Hiroki Naito
Daisuke Nagano
Kentaro Fujii
Daisuke Nagano
Kentaro Fujii