Title:
基材上に設けた透明導電膜を低抵抗化する方法。
Document Type and Number:
Japanese Patent JP4110752
Kind Code:
B2
Abstract:
A method of reducing resistance for a conductive film based on simple process at low temperatures, particularly a method of reducing resistance for a conductive film formed on a base of plastic resins is provided. A method of reducing resistance for a conductive film formed on a base material includes a treating process, in which a conductive film made of metal oxide is formed on a base material and irradiated with UV light in vacuum or in an atmosphere of reducing gas maintaining the temperature between 25° C. and 300° C.
Inventors:
Shigemi Otsu
Application Number:
JP2001196560A
Publication Date:
July 02, 2008
Filing Date:
June 28, 2001
Export Citation:
Assignee:
Fuji Xerox Co., Ltd
International Classes:
C23C14/58; H01B13/00; B05D3/06; B32B27/36; H01L21/203; H01L21/205; H01L21/3205; H01L23/52; H01L31/04; H01L51/44; H01L51/52
Domestic Patent References:
| JP11242916A | ||||
| JP11283445A | ||||
| JP10316427A | ||||
| JP11288625A | ||||
| JP8102227A | ||||
| JP62090809A | ||||
| JP63203757A | ||||
| JP2001001441A | ||||
| JP9175837A | ||||
| JP8167479A | ||||
| JP2000285752A |
Attorney, Agent or Firm:
Atsushi Nakajima
Kato Kazunori
Katsuichi Nishimoto
Hiroshi Fukuda
Kato Kazunori
Katsuichi Nishimoto
Hiroshi Fukuda