Title:
低エンドトキシンのキトサンの製造方法
Document Type and Number:
Japanese Patent JP6851823
Kind Code:
B2
Abstract:
The present invention relates to a process for producing a low endotoxin alkali chitosan, chitin, chitosan derivative or chitin derivative, and also to a process for producing low endotoxin neutral chitosan, chitosan salt and chitosan derivatives, and to the products of such processes. The process comprises contacting chitosan, chitin, chitosan derivative or chitin derivative with an alkali solution having a concentration of less than 0.25M to form a mixture; leaving the mixture for a period of less than 12 hours and optionally drying the mixture. The low endotoxin alkali chitosan may be used in the manufacture of other useful chitosan based products.
Inventors:
Hardy, Craig
Hogarth, Andrew
Gladman, June
Hogarth, Andrew
Gladman, June
Application Number:
JP2016516243A
Publication Date:
March 31, 2021
Filing Date:
May 29, 2014
Export Citation:
Assignee:
MEDTRADE PRODUCTS LIMITED
International Classes:
C08B37/08
Domestic Patent References:
| JP2008544014A | ||||
| JP2008532662A | ||||
| JP2016520157A |
Foreign References:
| US20050080245 | ||||
| US20080248508 | ||||
| WO2005005485A1 |
Attorney, Agent or Firm:
西浦 ▲嗣▼晴
High Miki Yoshiki
Tadashi Deyama
High Miki Yoshiki
Tadashi Deyama