Title:
3次元フォトニック結晶の作製方法
Document Type and Number:
Japanese Patent JP4677276
Kind Code:
B2
Abstract:
At least one exemplary embodiment is directed to a method for manufacturing a three-dimensional photonic crystal including a plurality of stacked layers having periodic structures where the thickness of the periodic structures in a layer are adjusted such that the layer satisfies the following equation: neff1xH1xM=neffxH wherein H1 represents the actual thickness of the layer, neff1 represents the actual refractive index of the periodic refractive index structure, H represents the design thickness of the layer, neff represents the design effective refractive index of the periodic refractive index structure, and M represents a coefficient inclusive and between 0.5 and 2.0.
Inventors:
Kazuya Nobayashi
Akira Takagi
Star light
Ikemoto Seio
Akira Takagi
Star light
Ikemoto Seio
Application Number:
JP2005136282A
Publication Date:
April 27, 2011
Filing Date:
May 09, 2005
Export Citation:
Assignee:
Canon Inc
International Classes:
G02B1/02; G02B5/20; G02B6/12; G02B6/13; H01S5/10
Domestic Patent References:
| JP2004188513A | ||||
| JP2001209189A | ||||
| JP2005012029A | ||||
| JP2004219688A |
Foreign References:
| US5998298 | ||||
| US5406573 |
Attorney, Agent or Firm:
Yukio Takanashi