How to use a zipper, a lithography device, and a zipper

Japanese Patent JP6122856

B2

A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed. In an embodiment, there is provided a chuck (43) for use in holding a patterning device (MA) or a substrate (W) onto a supporting table (MT, WT) of a lithography apparatus (100) by electrostatic force, in which the patterning device is for imparting a radiation beam (B) with a pattern in its cross-section to form a patterned radiation beam, and the substrate is for receiving the patterned radiation beam; said chuck comprising: a dielectric member (45); a temperature conditioning fluid channel (48) formed within the chuck; a drive electrode (40, 42) for applying a potential difference between the drive electrode and the patterning device or substrate across the dielectric member in order to electrostatically attract the patterning device or substrate towards the drive electrode; and a first shield electrode (60) for reducing or preventing the development of an electric field across temperature conditioning fluid in the temperature conditioning fluid channel due to a voltage applied to the drive electrode, in order to reduce or prevent electrolysis in the fluid.

Cornelisen, Sebastian, Maria, Johannes
Hillissen, Nowd, Jan
Siven, Anco, Josef, Cornellas
Notten Boom, Arnaud, Willem
Van der Wilk, Ronald
Schmitz, Roger, Wilhelms, Antonius, Henrix
Will, Manon, Elise

JP2014533823A

April 26, 2017

September 19, 2012

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AS M Netherlands B.V.

G03F7/20; H01L21/683; H02N13/00

JP2005183973A
JP2004282011A
JP2002004051A
JP2004095665A
JP2003243371A
JP2008028354A
JP2004158751A
JP9172053A
JP2011086712A

Yoshiyuki Inaba
Toshifumi Onuki

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