Title:
REFLECTION TYPE MASK
Document Type and Number:
Japanese Patent JPH07122480
Kind Code:
A
Abstract:
PURPOSE: To provide a reflection type mask capable of sharply transferring a pattern having a desired shape formed on a reflection type mask to a photosensitive member like resist, so as to have high precision and high contrast.
CONSTITUTION: A reflection type mask 1 is provided with a pattern having a desired shape and contains a board 2 on which a pattern having a desired shape is formed. A part corresponding with the pattern having a desired shape forms a protruding part 4, and the residual part forms a recessed part 5. The top part surface 3a of the protruding part 4 has light reflection characteristics, and the side wall 5S and the bottom surface 7 of the recessed part 5 have, at least, light absorption characteristics.
More Like This:
Inventors:
KATAYAMA MAKOTO
Application Number:
JP27063693A
Publication Date:
May 12, 1995
Filing Date:
October 28, 1993
Export Citation:
Assignee:
SUMITOMO ELECTRIC INDUSTRIES
International Classes:
G03F1/22; G03F1/24; H01L21/027; (IPC1-7): H01L21/027; G03F1/16
Attorney, Agent or Firm:
Fukami Hisaro (3 outside)