PRODUCTION OF FLUOROSILANE AND METHOD FOR PURIFYING SAME

Title:

PRODUCTION OF FLUOROSILANE AND METHOD FOR PURIFYING SAME

Document Type and Number:

Japanese Patent JPH0826715

Kind Code:

A

Abstract:

PURPOSE: To produce and purify fluorosilane useful as starting material for producing a semiconductor, electronic and optical materials.

CONSTITUTION: Hydrogen fluoride is allowed to react directly with chlorosilane represented by the formula SixHyCl2+2x--y [where (x) is an integer of ≥1 and (y) is an integer of 0 to (2x+1) but (x, y)≠(1, 2)] to produce the objective fluorosilane represented by formula, SixHyF2+2x-y [where (x) is an integer of ≥1 and (y) is an integer of 0 to (2x+1) but (x, y)≠(1, 2)]. Since this fluorosilane contains hydrogen chloride, it is blown into ether to selectively absorb and remove the hydrogen chloride.

Inventors:

OHASHI MITSUYA
SUENAGA TAKASHI
KIDA YASUSHI

Application Number:

JP16150894A

Publication Date:

January 30, 1996

Filing Date:

July 13, 1994

Export Citation:

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Assignee:

CENTRAL GLASS CO LTD

International Classes:

C01B33/107; (IPC1-7): C01B33/107

Attorney, Agent or Firm:

Eiichi Sakamoto

Next Patent: PRODUCTION OF POROUS SPHERICAL SILICA PARTICLE