Title:
【発明の名称】有磁気場励起マルチ容量プラズマ発生装置および関連方法
Document Type and Number:
Japanese Patent JPH09503350
Kind Code:
A
Abstract:
Plasma generation apparatus, and a related method for its operation, for producing a uniform high-density plasma with good process control and process repeatability. The apparatus includes multipe side electrodes (62.1, 62.6) to which first radio-frequency (rf) power source (57) is connected to provide a transverse electric field for plasma generation, and a pair of convention, upper and lower, electrodes (50, 52) to which a second rf power source (61) is connected to provide separate control of the plasma energy as used in a process such as dry etching. In addition, a magnetic field coil (60) provides a magnetic field perpendicular to the transverse electric field, for enhancement of plasma generation. Because the plasma is generated by a relatively lower frequency (50-200 MHz) power source, as compared with a microwave power source, the magnetic field strength needed to achieve magnetically enhanced operation at or near the electrom cyclotron resonance (ECR) condition is well under 100 gauss, which can be provided at relatively low cost. Moreover, the apparatus can be operated efficiently over a relatively wide range of chamber pressures. Ideally, the number of side electrodes used for plasma generation should be four or six, with each electrode receiving a phase delayed signal as compared with an adjacent electrode, to produce a rotating electric field that further enhances uniformity of plasma formation.
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Inventors:
Inn, Gerald, Zeyao
Hanawa, Hiroji
Smith, kennis
Hanawa, Hiroji
Smith, kennis
Application Number:
JP53041995A
Publication Date:
March 31, 1997
Filing Date:
May 15, 1995
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
C23C16/50; C23C16/511; C23F4/00; H01J37/32; H01L21/205; H05H1/46; H01L21/302; H01L21/3065; (IPC1-7): H01L21/3065; C23F4/00; H05H1/46
Attorney, Agent or Firm:
Yoshiki Hasegawa (4 outside)