【発明の名称】リソグラフィ用反射型マスクおよび縮小投影露光装置

Japanese Patent JP3078163

B2

A reflection type mask includes a reflective portion effective to reflect soft X-rays or vacuum ultraviolet rays, and an absorbent material pattern formed on the reflecting portion, wherein, when the wavelength of the soft X-rays or vacuum ultraviolet rays is denoted by lambda and the optical constant of the material constituting the absorbent material pattern is denoted by 1- delta -ik (where delta and k are real numbers while i is an imaginary number), a relation 0.29