Title:
【発明の名称】蒸気形態の試薬をCVD反応器に供給するための装置および方法
Document Type and Number:
Japanese Patent JP3103596
Kind Code:
B2
Abstract:
A process system comprising a liquid reagent vaporization and supply apparatus (300) including a vaporization chamber housing (302) having a porous vaporization element (340) therein in proximity to the housing interior wall surface (320) to define liquid flow channels (332, 324, 326, 328). A pump assembly (10) may be used in such system to pump air- or moisture-sensitive liquids, in which the wetted parts of the pump are blanketed with an inert medium and/or the process liquid with a low vapor pressure liquid component effective for inhibiting corrosion or particulate formation. In another aspect, the invention relates to a means and method for protecting a source reagent vaporizer (17) from the harmful effects of solid build-up occurring during its use in chemical vapor deposition (CVD), due to premature decomposition of the source reagent on the vaporizer element and oxidative decomposition of the source reagent to produce solid products which cause clogging and inefficient vaporization, by periodically flush cleaning such vaporizer element to increase its consistency, reliability, and service life.
Inventors:
Carlin Peter S
Gardiner Robin A
Van buskerk peter
Gardiner Robin A
Van buskerk peter
Application Number:
JP52109294A
Publication Date:
October 30, 2000
Filing Date:
March 07, 1994
Export Citation:
Assignee:
Advanced Technology Materials Incorporated
International Classes:
B01F23/10; B01J4/02; B01J7/00; C01B21/076; C01G1/00; C01G3/00; C01G23/00; C04B38/00; C23C16/40; C23C16/44; C23C16/448; F04B53/02; F04B53/16; F23K5/22; H01L39/24; (IPC1-7): C23C16/448; B01J4/02; B01J7/00; C01B21/076; C01G1/00; C01G3/00; C01G23/00; C04B38/00; F04B53/02; F04B53/16; F23K5/22
Other References:
【文献】米国特許4036915(US,A)
【文献】米国特許4288369(US,A)
【文献】米国特許4833976(US,A)
【文献】米国特許4288369(US,A)
【文献】米国特許4833976(US,A)
Attorney, Agent or Firm:
Yoshihisa Oshida