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Patent Searching and Data


Title:
POLYESTER RESIN AND PRODUCTION THEREOF
Document Type and Number:
Japanese Patent JPH07118382
Kind Code:
A
Abstract:

PURPOSE: To obtain a heat-resistant polyether resin having a specific structure, a low surface energy, and water and oil repellency by reacting a specific triazine dichloride with a specific aromatic diol.

CONSTITUTION: A triazine dichloride (a) represented by formula I (wherein R is a 1-18C perfluoroalkyl, e.g. trifluoromethyl or perfluoropropyl) is reacted with an aromatic diol (b) represented by formula II (wherein Ar is an aromatic group) to produce a polyether resin (C) represented by formula III (wherein n is 10-200). For example, the compounds (a) and (b) are reacted in an equimolar proportion in a two-phase system consisting of an organic solvent phase and an aqueous alkali solution phase in the presence of a phase-transfer catalyst. Examples of the diol (b) include hydroquinone and resorcinol. The resin (c) has a low surface energy, is soluble in various organic solvents, and has a high glass transition temp. It has low wettability by liquids and solids, i.e., has poor bondability. If the compound (a) is used in combination with the triazine chloride represented by formula I where R is H, the compound (a) should be used in an amount not smaller than 20mol% so as to obtain sufficient water and oil repellency.


Inventors:
OISHI YOSHIYUKI
MORI KUNIO
HIRAHARA HIDETOSHI
TAKIZAWA TOSHIKI
Application Number:
JP26382193A
Publication Date:
May 09, 1995
Filing Date:
October 21, 1993
Export Citation:
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Assignee:
JAPAN RES DEV CORP
International Classes:
C08G65/40; (IPC1-7): C08G65/40
Attorney, Agent or Firm:
Hiroshi Tanaka