Title:
【発明の名称】遮断(blocked)ポリヒドロキシスチレン樹脂の精製溶液を製造する方法
Document Type and Number:
Japanese Patent JP2002514792
Kind Code:
A
Abstract:
1. A process for preparing a purified solution of blocked polyhydroxystyrene resin in reaction/photoresist solvent, comprising the steps of: (1) forming an impure reaction solution comprising blocked polyhydroxystyrene resin and acidic catalyst in reaction/photoresist solvent; (2) adding amine, at least one hydrophilic solvent, at least one hydrophobic solvent and water to said impure reaction solution, thereby forming an aqueous phase comprising water, the hydrophilic solvent, and at least one salt of the amine and the acidic catalyst and an organic phase comprising the hydrophilic solvent, the hydrophobic solvent, the reaction/photoresist solvent and the blocked polyhydroxystyrene resin; (3) separating the aqueous phase from the organic phase; and (4) removing the hydrophilic solvent and the hydrophobic solvent from the organic phase, thereby forming a purified solution of blocked polyhydroxystyrene resin in reaction/photoresist solvent.
Inventors:
Davidson James M
Application Number:
JP2000548772A
Publication Date:
May 21, 2002
Filing Date:
April 23, 1999
Export Citation:
Assignee:
OLIN MICROELECTRONIC CHEMICALS,INC.
International Classes:
C08F6/02; C08F8/00; G03F7/039; G03F7/004; (IPC1-7): G03F7/039; C08F8/00
Attorney, Agent or Firm:
Mikio Nakabayashi