Title:
【発明の名称】半導体製造工程用のリソグラフィ光源を提供するためのシステムおよび方法
Document Type and Number:
Japanese Patent JP2002544675
Kind Code:
A
Abstract:
A method for providing a lithographic light source is provided that includes producing a process fluid plume. A coaxial shielding fluid is produced around the process fluid plume. A plasma is generated by providing an energy source that impinges on the process fluid plume.
Inventors:
Hearth, edwin, gee
Gatuski, Rabat, M
Career, Vinsanto, Es
Gatuski, Rabat, M
Career, Vinsanto, Es
Application Number:
JP2000617700A
Publication Date:
December 24, 2002
Filing Date:
May 05, 2000
Export Citation:
Assignee:
Advanced, energy, cistims, ink
International Classes:
G03F7/20; H01L21/027; H05G2/00; (IPC1-7): H01L21/027; G03F7/20
Attorney, Agent or Firm:
Sanada Yuzo (2 outside)