Title:
ILLUMINATION OPTICAL EQUIPMENT
Document Type and Number:
Japanese Patent JP3670470
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide an illumination optical equipment capable of restraining the haze of an illumination optical system in which an illumination light of high energy enters.
SOLUTION: A shutter mechanism 517 is installed between a hevy hydrogen lamp and a total reflection mirror of an illumination optical system. When a specimen is irradiated with UV rays L2, the shutter mechanism 517 makes a shutter 517e retreat from a through hole 517c. The UV ryas 12 is guided to an illumination position, and spectral characteristics in the UV region are measured, thereby enabling the measurement of the thickness of an ultrathin film. When it is not necessary for the illumination position to be irradiated with the UV rays, the shutter 517e blocks the through hole 517c, and incidence of UV rays (illumination light) from the heavy hydrogen lamp into the illumination system is forbidden.
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Inventors:
Naoshi Fukao
Application Number:
JP32734197A
Publication Date:
July 13, 2005
Filing Date:
November 28, 1997
Export Citation:
Assignee:
Dainippon Screen Mfg. Co., Ltd.
International Classes:
G01B11/00; G01B11/06; G02B3/00; G02B5/08; (IPC1-7): G01B11/06
Domestic Patent References:
| JP10293063A | ||||
| JP10232113A |
Attorney, Agent or Firm:
Etsushi Kotani
Kyuichi Ueki
Tadashi Nagata
Kakusho Shoichi
Kyuichi Ueki
Tadashi Nagata
Kakusho Shoichi