Title:
投影リソグラフィのための照明光学アセンブリ
Document Type and Number:
Japanese Patent JP6683688
Kind Code:
B2
Abstract:
An illumination optical assembly for projection lithography serves for illuminating an object field, in which an object to be imaged is arrangeable. The object field has a scan length along an object displacement direction. The illumination optical assembly has two facet mirrors for the reflective guidance of illumination light towards the object field. Second facets of the second facet mirror serve for guiding a respective illumination light partial beam into the object field. The second facet mirror is a pupil distance from a pupil plane of the illumination optical assembly that is closest adjacent to the second facet mirror. The second facets are arranged in a grid, wherein at least one grid constant of the grid is predefined by the pupil distance and by the scan length. This results in an illumination optical assembly which achieves an illumination of predefined pupil sections that is relatively homogeneous.
Inventors:
Endless Martin
Application Number:
JP2017512828A
Publication Date:
April 22, 2020
Filing Date:
August 21, 2015
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; G02B19/00
Domestic Patent References:
| JP2010539716A | ||||
| JP2017507356A |
Foreign References:
| US20110001947 |
Attorney, Agent or Firm:
Shinichiro Tanaka
Disciple Maru Ken
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Naoki Kondo
Hiroshi Oura
Disciple Maru Ken
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Naoki Kondo
Hiroshi Oura